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Refractive index invariably describes the speed at which light passes through materials, and subsequently its perceived momentum. But what happens to these quantities as the index becomes zero? A new work explores this question, highlighting how momentum in near-zero-index materials affects linear optical processes.

 

To address the challenges of developing a scalable system of an on-chip integrated quantum emitter, we propose to leverage the loss in our hybrid plasmonic-photonic structure to simultaneously achieve Purcell enhancement as well as on-chip maneuvering of nanoscale emitter via optical trapping with guided excitation-emission routes. In this report, we have analyzed the feasibility of the functional goals of our proposed system in the metric of trapping strength (∼8K_BT), Purcell factor (>1000∼), and collection efficiency (∼10%). Once realized, the scopes of the proposed device can be advanced to develop a scalable platform for integrated quantum technology.

 

Plasmonic-based integrated nanophotonic modulators, despite their promising features, have one key limiting factor of large insertion loss (IL), which limits their practical potential. To combat this, we utilize a plasmon-assisted approach through the lens of surface-to-volume ratio to realize a 4-slot based EAM with an extinction ratio (ER) of 2.62 dB/µm and insertion loss (IL) of 0.3 dB/µm operating at ∼1 GHz and a single slot design with ER of 1.4 dB/µm and IL of 0.25 dB/µm operating at ∼20 GHz, achieved by replacing the traditional metal contact with heavily doped indium tin oxide (ITO). Furthermore, our analysis imposes realistic fabrication constraints, and material properties, and illustrates trade-offs in the performance that must be carefully optimized for a given scenario. 

In its 60 years of existence, the field of nonlinear optics has gained momentum especially over the past two decades thanks to major breakthroughs in material science and technology. In this article, we present a new set of data tables listing nonlinear-optical properties for different material categories as reported in the literature since 2000. The papers included in the data tables are representative experimental works on bulk materials, solvents, 0D–1D–2D materials, metamaterials, fiber waveguiding materials, on-chip waveguiding materials, hybrid waveguiding systems, and materials suitable for nonlinear optics at THz frequencies. In addition to the data tables, we also provide best practices for performing and reporting nonlinear-optical experiments. These best practices underpin the selection process that was used for including papers in the tables. While the tables indeed show strong advancements in the field over the past two decades, we encourage the nonlinear-optics community to implement the identified best practices in future works. This will allow a more adequate comparison, interpretation and use of the published parameters, and as such further stimulate the overall progress in nonlinear-optical science and applications.

 

The conversion of a photon’s frequency has long been a key application area of nonlinear optics. It has been discussed how a slow temporal variation of a material’s refractive index can lead to the adiabatic frequency shift (AFS) of a pulse spectrum. Such a rigid spectral change has relevant technological implications, for example, in ultrafast signal processing. Here, we investigate the AFS process in epsilon-near-zero (ENZ) materials and show that the frequency shift can be achieved in a shorter length if operating in the vicinity of$\mathrm{R}\mathrm{e}\{{\mathrm{\epsilon <\#comment/>}}_r\}=0$. We also predict that, if the refractive index is induced by an intense optical pulse, the frequency shift is more efficient for a pump at the ENZ wavelength. Remarkably, we show that these effects are a consequence of the slow propagation speed of pulses at the ENZ wavelength. Our theoretical predictions are validated by experiments obtained for the AFS of optical pulses incident upon aluminum zinc oxide thin films at ENZ. Our results indicate that transparent metal oxides operating near the ENZ point are good candidates for future frequency conversion schemes.

 

Titanium nitride (TiN) is highly attractive for plasmonics and nanophotonics applications owing to its gold‐like but tunable optical properties. Its prodigious potential for plasmonics has been demonstrated on sapphire or bulk MgO. For a transformational impact, high optical quality TiN on Si is required instead, which would support the integration of nanophotonics with the complementary metal‐oxide‐semiconductor (CMOS) electronics. However, TiN grown on Si, even at elevated temperatures, lacks the optical quality needed, imposed by the large lattice mismatch between them. Here, a novel approach is reported wherein a thin MgO interlayer is inserted between TiN and Si. The improved crystalline quality enabled by MgO for TiN on Si(001) leads to a significant enhancement of the plasmonic figure of merit (FOM = −ε′/ε″) from 2.0 to 2.5 at telecommunication wavelength (peak FOM of 2.8), which is comparable to the widely accepted ultimate FOM obtained on bulk MgO grown under similar conditions. The TiN/MgO/Si structure enables the hybrid‐plasmonic‐photonic waveguide platform with sufficiently low losses, and thus long propagation lengths, for nanophotonic devices while providing additional practical advantages such as serving as a self‐aligned robust etching mask. Thus, the much‐anticipated potential of TiN on Si platform for CMOS compatible plasmonics is brought closer to reality.